MOSIS PARAMETRIC TEST RESULTS RUN: N57V VENDOR: ORBIT TECHNOLOGY: SCNA20 FEATURE SIZE: 2.0 microns
INTRODUCTION: This report contains the lot average results obtained by MOSIS
from measurements of the MOSIS test structures on each wafer of
this fabrication lot. The SPICE parameters obtained from similar
measurements on a selected wafer are also attached.
COMMENTS: This looks like a typical Orbit Semiconductor 2.0 um n-well run.
TRANSISTOR PARAMETERS W/L N-CHANNEL P-CHANNEL UNITS
MINIMUM 3/2
Vth 0.90 -1.01 Volts
SHORT 18/2
Vth 0.82 -0.99 Volts
Vpt 13.8 -15.6 Volts
Vbkd 13.1 -15.7 Volts
Idss 2570 -1228 uA
WIDE 120/2
Ids0 7.5 -0.4 pA
LARGE 50/50
Vth 0.85 -0.98 Volts
Vjbkd 16.1 -17.2 Volts
Ijlk -7.4 -2.1 pA
Gamma 0.23 0.72 V^0.5
Delta length 0.45 0.47 microns
(L_eff = L_drawn-DL)
Delta width 0.00 -0.27 microns
(W_eff = W_drawn-DW)
K' (Uo*Cox/2) 25.2 -8.6 uA/V^2
POLY2 TRANSISTORS W/L N-CHANNEL P-CHANNEL UNITS
MINIMUM 6/4
Vth 0.85 -1.36 Volts
SHORT 36/4
Vth 0.80 -1.32 Volts
LARGE 36/36
Vth 0.82 -1.34 Volts
FOX TRANSISTORS GATE N+ACTIVE P+ACTIVE UNITS
Vth Poly 18.1 -14.7 Volts
BIPOLAR PARAMETERS W/L NPN UNITS
2X1 2X1
Beta 139
V_early 52.8 Volts
Vce,sat 0.4 Volts
2X2 2X2
Beta 137
V_early 49.7 Volts
Vce,sat 0.2 Volts
2X4 2X4
Beta 131
V_early 47.1 Volts
Vce,sat 0.3 Volts
2X8 2X8
Beta 126
V_early 45.3 Volts
Vce,sat 0.6 Volts
BVceo 20.5 Volts
BVcbo 20.5 Volts
BVebo 8.8 Volts
PROCESS PARAMETERS N+DIFF P+DIFF POLY POLY2 METAL1 METAL2 N WELL UNITS
Sheet Resistance 25.2 59.4 23.3 19.6 0.05 0.03 2628 ohms/sq
Width Variation 0.23 -0.11 -0.30 -0.59 -0.21 0.10 microns
(measured - drawn)
Contact Resistance 34.3 135.4 9.6 9.1 0.04 ohms
Gate Oxide Thickness 420 angstroms
CAPACITANCE PARAMETERS N+DIFF P+DIFF POLY POLY2 METAL1 METAL2 UNITS
Area (substrate) 117 327 45 18 12 aF/um^2
Area (poly) 443 38 14 aF/um^2
Area (poly2) 40 aF/um^2
Area (metal1) 28 aF/um^2
Area (N+active) 823 657 34 15 aF/um^2
Area (P+active) 820 658 aF/um^2
Fringe (substrate) 481 265 aF/um
Fringe (N+active) 21 aF/um
Fringe (P+active) 6 aF/um
CIRCUIT PARAMETERS UNITS
Inverters K
Vinv 1.0 2.10 Volts
Vinv 1.5 2.30 Volts
Vol (100 uA) 2.0 0.27 Volts
Voh (100 uA) 2.0 4.63 Volts
Vinv 2.0 2.44 Volts
Gain 2.0 -11.67
Ring Oscillator
MOSIS (31 stages) 32.79 MHz
N57V SPICE LEVEL2 PARAMETERS
.MODEL CMOSN NMOS LEVEL=2 PHI=0.700000 TOX=4.4900E-08 XJ=0.200000U TPG=1
+ VTO=0.8836 DELTA=2.3180E+00 LD=2.2580E-07 KP=4.7767E-05
+ UO=621.1 UEXP=1.5300E-01 UCRIT=9.1900E+04 RSH=2.52E+01
+ GAMMA=0.6621 NSUB=7.8110E+15 NFS=7.1500E+11 VMAX=6.5940E+04
+ LAMBDA=3.2490E-02 CGDO=6.12E-10 CGSO=6.12E-10
+ CGBO=3.4595E-10 CJ=1.12E-04 MJ=0.95 CJSW=4.30E-10
+ MJSW=0.455 PB=0.61
* Weff = Wdrawn - Delta_W
* The suggested Delta_W is 2.6460E-09
.MODEL CMOSP PMOS LEVEL=2 PHI=0.700000 TOX=4.4900E-08 XJ=0.200000U TPG=-1
+ VTO=-0.8459 DELTA=4.2900E+00 LD=2.3460E-07 KP=1.5574E-05
+ UO=202.5 UEXP=2.5600E-01 UCRIT=1.2610E+05 RSH=5.94E+01
+ GAMMA=0.6851 NSUB=8.3620E+15 NFS=1.0830E+11 VMAX=9.9990E+05
+ LAMBDA=4.3760E-02 CGDO=6.12E-10 CGSO=6.12E-10
+ CGBO=3.8732E-10 CJ=3.24E-04 MJ=0.633 CJSW=1.89E-10
+ MJSW=0.929 PB=0.90
* Weff = Wdrawn - Delta_W
* The suggested Delta_W is -2.7000E-07
================================================
N57V SPICE BSIM1 (Berkeley Level 4; HSPICE Level 13) PARAMETERS
NM1 PM1 DU1 DU2 ML1 ML2
*
*PROCESS=ORBIT
*RUN=n57v
*WAFER=10
*Gate-oxide thickness= 449 angstroms
*Geometries (W-drawn/L-drawn, units are um/um) of transistors measured were:
* 3.0/2.0, 6.0/2.0, 18.0/2.0, 18.0/5.0, 18.0/25.0
*Bias range to perform the extraction (Vdd)=5 volts
*DATE=15-Sep-1995
*
*NMOS PARAMETERS
*
-9.29374E-01, 1.75717E-01, 2.53687E-01
7.46818E-01, 0.00000E+00, 0.00000E+00
1.46728E+00,-2.27217E-01,-2.37445E-01
3.00399E-01, 2.07963E-02,-2.99976E-01
-9.79388E-03, 4.60109E-02,-2.22619E-02
6.85713E+02,5.09278E-001,-1.44300E-001
5.28114E-02, 4.09290E-02,-7.51077E-02
3.50986E-01, 5.33109E-01,-3.27872E-01
9.41154E+00,-5.53126E+00, 7.85492E+01
-1.93623E-03,-9.04089E-03,-5.90268E-03
5.75590E-04,-2.96780E-03,-8.71981E-03
1.86391E-03,-1.00783E-03, 2.56224E-02
1.26538E-02,-2.76701E-02, 8.93641E-02
8.47841E+02, 6.38811E+02,-5.09701E+02
-7.28783E+00, 4.71113E+01, 1.33831E+02
1.10468E+01, 1.14599E+02,-7.66350E+01
1.63049E-02, 1.10119E-01,-9.55543E-02
4.49000E-002, 2.70000E+01, 5.00000E+00
6.12E-010,6.12E-010,3.67765E-010
1.00000E+000,0.00000E+000,0.00000E+000
1.00000E+000,0.00000E+000,0.00000E+000
0.00000E+000,0.00000E+000,0.00000E+000
0.00000E+000,0.00000E+000,0.00000E+000
*
* Gate Oxide Thickness is 449 Angstroms
*
*PMOS PARAMETERS
*
-4.38695E-01, 3.80190E-01,-4.80284E-01
6.91803E-01, 0.00000E+00, 0.00000E+00
7.28490E-01,-3.27229E-01, 7.30653E-01
3.50364E-03,-6.40594E-04, 1.78077E-01
-1.47658E-02, 5.63401E-02,-1.49919E-02
2.28449E+02,8.89430E-001,2.44729E-001
9.50778E-02, 6.78824E-02,-6.38273E-02
2.25998E-02, 1.56956E-01, 2.13976E-03
9.87660E+00,-4.20161E+00, 5.48165E+00
-2.09758E-03,-1.28037E-03,-3.08801E-03
1.20442E-03,-3.77126E-03,-4.63365E-06
4.03566E-03, 4.62297E-04, 1.51254E-04
-7.51253E-05, 5.05991E-03, 6.96859E-03
2.34986E+02, 7.25957E+01, 1.67228E+02
7.77912E+00, 2.08715E+00, 1.80980E+01
-1.06046E+00, 1.05111E+01, 1.02053E+01
-1.26453E-02, 2.24832E-03, 1.67275E-02
4.49000E-002, 2.70000E+01, 5.00000E+00
6.12E-010,6.12E-010,4.04517E-010
1.00000E+000,0.00000E+000,0.00000E+000
1.00000E+000,0.00000E+000,0.00000E+000
0.00000E+000,0.00000E+000,0.00000E+000
0.00000E+000,0.00000E+000,0.00000E+000
*
*N+ diffusion::
*
25.2, 1.080000e-04, 4.116900e-10, 1e-08, 0.8
0.8, 1.05826, 0.454471, 0, 0
*
*P+ diffusion::
*
59.4, 3.258700e-04, 2.428400e-10, 1e-08, 0.8
0.8, 0.599914, 1.26799, 0, 0
*
*METAL LAYER -- 1
*
0.03, 2.6e-05, 0, 0, 0
0, 0, 0, 0, 0
*
*METAL LAYER -- 2
*
2628, 1.3e-05, 0, 0, 0
0, 0, 0, 0, 0